Technology Development Process Shift Engineer, Dry Etch

6日前

Higashihiroshima Micron

Our vision is to transform how the world uses information to enrich life for all.

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.

JR55827 Technology Development Process Shift Engineer, Dry Etch

Dry Etch Shift Engineerは、広島工場のTD PD、PI並びに広島工場 量産部門と連携し24時間7日間の技術開発を実施する。
主な業務内容は、新規デバイス開発業務、新規装置立ち上げ業務、Redundancy tool展開、TD DEVICEにおける敏速な異常品対応などを実施、24/7止まらない技術開発を実現する。

業務詳細

  • Dry Etch エリアにおける24時間7日間の技術開発を実施する。開発デバイスにおける Level Owner 業務(プロセスセットアップ、プロセス改善評価、SPC、Redundancy展開などPMIに規定された開発業務)の実施。新規装置評価、材料評価を含んだプロセス開発。新規装置の立ち上げ業務を装置ベンダ-、広島工場のTD PDと共に実施する。TD DEVICE における、DryETCHプロセス異常品発生時の敏速かつ的確な処置を実施しスムーズにロットをリリースする。慢性プロセス問題に関し、解決についてのデータ収集及びデータまとめを行い、広島工場TD PDもしくは広島工場量産部門へエスカレーションする。
  • 開発ロットのサイクルタイム改善活動(Redundancy tool の展開、量産品との条件一致化など)を広島工場 製造関係者とともに実施する。

    • 必須要件(全条件を必ずしも満足してなくてもよい。)

  • 基本的な、半導体に関する知識を有する。
  • 必要な教育を理解して、実施することができること。
  • エリアの問題点の把握、及びその改善を、チームメンバーと共に遂行することができること。
  • Microsoft Office(Excel, PowerPoint, Word)などの基本的なソフトウェアを使用できる。
  • データを抽出し、決められたデータ整理を行い、レポートできるスキルを有している。
  • プロセスに関連する基本的な問題へのトラブルシューティングをすることができる。
  • 職場ルールを順守し、問題が生じた場合には、適宜、上司へ報告/連絡/相談することができること。
  • 関係部門とコミュニケーションを図る能力を有していること。
  • 仕事に前向きに取り組むことができる。
  • 自己管理(業務面、健康面)ができる。
  • 語学力 (文章・メールで英語を使用した実務経験、若しくはアレルギーの無い方)
  • シフト勤務に対応可能な方 (4勤4休シフト)

    • 歓迎要件

  • Dry Etchプロセス経験者

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